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Advanced Cmos Process Technology (V L S I Electronics) (v. 19)

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The microelectronics revolution persists. Technical innovations abound, and the performance-to-cost ratios for semiconductor devices, integrated circuits, and systems continue to grow. Although it might be entertaining, a historical account of the past three decades of microelectronics would provide little direct benefit to the industry. This volume of the VLSI Electronics series, titled Advanced CMOS Process Technology, provides a current snapshot of one highly pertinent domain of microelectronics. For reasons discussed within the text, CMOS (complementary metal-oxide - semiconductor) technology plays a leading role in present and future elec- tronic systems.

In choosing appropriate material for this monograph, we specified two selection criteria. First, we sought topics of primary importance to the present and future state of the art of CMOS process technology. Second, where constraints of space and time imposed on the number of topics to cover, we focused on issues with the least amount of coverage in other forums. Aside from introductory comments and background on CMOS device and circuit considerations, we narrowed our topic list to metalliza tion, isolation techniques, reliability, and yield. The reader should not infer that omitted areas, including lithography and etching techniques, are of inferior rank. Rather, such topics have enjoyed a good deal of explicit scrutiny in, for example, earlier volumes of this VLSI Electronics series.

Finally, we note that it has been and is our goal to contribute to the global microelectronics industry by reporting as clearly as possible the present status of the CMOS process technology issues we chose to commu nicate. Furthermore, we attempted to project as accurately as possible expected future evolution. This contribution is transitory. We expect the industry to surpass the technical content of this monograph through inno vation, invention, and, a la Thomas Edison, perspiration. In fact, we dedicate this volume to the engineers, scientists, and technical managers who will render obsolete many of the technical concerns we voice.
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