Fabrication of SiGe HBT BiCMOS Technology
While the idea of cleverly using silicon–germanium (SiGe) and silicon (Si) strained-layer epitaxy to
practice bandgap engineering of semiconductor devices in the highly manufacturable Si material system
is an old one, only in the past decade has this concept become a practical reality. The final success of
creating novel Si... Molecular Imprinting (Topics in Current Chemistry)
Molecularly Imprinted Polymers, by Karsten Haupt, Ana V. Linares, Marc Bompart und Bernadette Tse Sum Bui.- Physical Forms of MIPs, by Andrea Biffis, Gita Dvorakova und Aude Falcimaigne-Cordin.- Micro and Nanofabrication of Molecularly Imprinted Polymers, by Marc Bompart, Karsten Haupt und Cédric Ayela.-...
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